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023005-XX.XX 3.0″ UHV Mount
3.0″ SCA SOURCE – ACCEPTS 3.0″ DIAMETER TARGETS UHV – All weld construction mounted on a 6.0″ CF.
Ideal for research and production sputtering of metals, oxides, and magnetic materials for semiconductor, optical, and advanced coating applications.
- Description
- Specifications & Dimensions
Description
The Bricada SCA Series Sputter Cathodes are precision-engineered magnetron sources designed for consistent, high-quality thin film deposition. Engineered for UHV and HV systems, the SCA series provides exceptional rate stability, process flexibility, and film uniformity across a broad range of materials and substrate sizes.
Features:
- High-strength NdFeB magnet arrays for superior target utilization and uniform plasma density
- Optimized magnetic field design for superior film uniformity and deposition rates
- Magnets and power isolated from cooling water
- Quick target change without disassembly or clamping
- Supports a wide range of target materials and thicknesses
- Magnetic materials sputtered without changing magnet array
- Single vacuum seal design – no water-to-vacuum seals
- Compatible with DC, RF, Pulsed
- DC, and HiPIMS
- Adjustable anode improves uniformity and minimizes build-up and shadowing
