Carbon (graphite) (C) | 76,2 x 6,3 mm | 99,99%

Description

Standard carbon (graphite) targets can be very difficult to sputter. Carbon has one of the lowest sputtering yields of all elements due to its Sp2 microstructure and anisotropic electrical properties. Due to the open sites in the structural lattice of carbon, sputtering rates are low and the process is very time consuming. Standard carbon graphite targets are typically produced by hot pressing. These targets tend to be highly porous and contain randomly oriented grains, resulting in different local effects that contribute to the low sputtering yield.

In contrast, pyrolytic graphite sputtering targets are much more oriented and can sputter at higher rates. Pyrolytic graphite targets are produced by chemical vapor deposition (CVD) and grown atom by atom. The resulting material has improved thermal, electrical and chemical properties. Due to the nature of the CVD deposition process, pyrolytic graphite material approaches theoretical density and is essentially non-porous, allowing rapid outgassing.

* This is a recommendation based on our experience with these materials in our sputter guns. Rates are based on non-bonded targets and are material specific. Bonded targets should be operated at lower power to avoid bonding failure. Bonded targets should be operated at 20 watts/square inch or lower depending on the material.