RFG-300 RF Plasma Generators 300W

Description

RF Generators for Sputtering and Plasma generators manufactured by Vac Techniche Ltd are reliable devices for industrial and laboratory deposition, plasma generation, and even dielectric heating and melting. This device is also one of the most important components of semiconductor manufacturing systems, used for producing integrated circuits (ICs) and chips present in modern computers and electronic equipment. The Vac Techniche RF generator along with its impedance matching network constitute a complete RF plasma generation assembly. The RF generator is designed and built with 27.12 MHz, 13.56 MHz, 2 MHz or other frequency bands according to the customer .

• Reflected power limiter
• Air-cooling (DC to RF conversion efficiency larger than 70%)
• Graphical control, display and adjustment system with a touch screen
• Various protection types (against reflected power, overtemperature, overcurrent, and overvoltage), capable of automatically limiting the transmitted power
• 0-5 V input voltage for remotely controlling the generator output power; more than 90% efficiency for larger than 300 W models
• Analog output for transmitted and reflected power values
• Closed-loop control of output power which stabilizes the adjusted power with time
• Adequate shielding to prevent radiation and EMI noise with necessary measures to protect operator health
• Rack-installable box