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Electron source ES 40C1
Scanable electron source with small spot profile.
- Description
- Technical Data
- Features
- Options
Description
Due to the high transmission of its Einzel-Lens, the ES 40C delivers a high electron beam current over a wide energy range. The ES 40C1 is designed for a stable and reliable operation in e.g. AES, scanning applications, imaging, EELS and electron pulse or desorption experiments (ESD).
| Mounting flange | DN 40CF (rotatable) |
| Energy range | 0 – 5 keV |
| Sample current | up to 100 μA |
| Scan area | 10 mm x 10 mm |
| Shield | Cu or μ-metal |
| Cathode type | thoriated tungsten |
| Insertion length | min. 155.7 mm, (other on request) OD: 33.5 mm (μ-metal), 35 mm (Cu) |
| FWHM | dependent on working distance, min. 120 µm (for distance 56 mm) |
| Working distance | 23 mm – 150 mm (typical 75 mm) |
| Bakeout temperature | up to 250 °C |
| Working pressure | < 5×10-6 mbar |
- Fine focus microformed tip cathode
- Scannable electron source with a small spot profile
- Correction of incident electron beam angle (provided by ES40-PS power supply)
- Integrated scan and deflection unit
- Linear shift
- Customised insertion length
- Source shielding material (μ-metal or copper)
